Inficon





Worldwide


Semiconductor

Products:


> FabGuard Software Suite
> Integrated Process Monitoring
> Leak Detectors
> RF Sensing Technology with FabGuard
 
•  RFS100 RF Sensor
•  Sion RF Detector for Endpoint Control
•  Sion RF Detector for Plasma Arc Detection
   
> Residual Gas Analyzers
> Vacuum Components
> Vacuum Gauges
> Vacuum Valves and Gas Dosing Systems



Sion RF Detector for Endpoint Control

Highly Accurate, Repeatable Chamber Clean Endpoint Control That Reduces Costs

Sion™ RF Detector gives you tighter control and higher yields in chemical vapor deposition (CVD) and etch processes by reliably and accurately determining the chamber clean endpoint. More accurate endpointing means lower on-wafer particle levels and more time between preventative maintenance cycles.

Providing a number of advantages over optical emission spectrometer (OES)-based controllers, Sion works with FabGuard® Integration and Analysis System to reduce the wasted time and materials that result from chamber clean under- or over-etching.

Features at a Glance
  • Easy drop-in replacement for OES-based instrument for more accurate endpoint control
  • Eliminates chamber clean under- and over-etching, reducing cost of time and materials
  • Reduces required clean gas flow levels and cost
  • Increases tool uptime by eliminating chamber window maintenance and replacement

QUESTIONS? Contact your local representative, click here.

ASSOCIATED TECHNICAL INFORMATION

Brochures and Datasheets:

   Brochure - Sion RF Detector for Endpoint Control
English

Request Further Information from Inficon.
REQUEST INFO. I'd like additional information, click here.
Sion RF Detector for Endpoint Control Eliminates Over-Etching for Increased Throughput
FabGuard Sensor Integration and Analysis System


Contact your local representative.


GOT A SHOT? Send us your photo of an INFICON product at work. We'll send you a very cool gift!